Application Type
National Patent
Application SubType
(10) Registration Number and Date
Status
ACTIVE ( Application filed)
(180) Expiration Date
(20) Filing Number and Date
MY PI2026001456 2026.03.13
(40) Publication Number (Gazette Number) and Date
(85) National Entry Date
(30) Priority Details
JP
JP2023-002993
2023.01.12
(51) IPC Classes
(72) Inventor
(74) Representative
(EN) SOO EE LIN : C/O SPRUSON & FERGUSON (M) SDN. BHD., Suite A-39-5, Level 39, Menara UOA Bangsar, Tower A, No. 5, Jalan Bangsar Utama 1, 59000 Wilayah Persekutuan
(54) Title
(EN) PLASMA TREATMENT DEVICE AND PLASMA TREATMENT METHOD
(57) Abstract
(EN) A plasma processing apparatus includes a chamber, a substrate support, at least one antenna, and a radio-frequency generator. The chamber includes a dielectric window. The dielectric window is between the substrate support and the antenna. The radio-frequency generator generates first radio-frequency power and second radio-frequency power. The first radio-frequency power has a first frequency. The second radio-frequency power has a second frequency. The dielectric window has a larger dielectric loss at the second frequency than at the first frequency. Fig. 1
(58) Citations
License Details
(98) Annuity Details
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